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Article Dans Une Revue Biosensors and Bioelectronics Année : 2018

Atomic layer deposition for biosensing applications

Octavio Graniel
Matthieu Weber
Sebastien Balme
Mikhael Bechelany

Résumé

Atomic layer deposition (ALD) is a thin film deposition technique currently used in various nanofabrication processes for microelectronic applications. The ability to coat high aspect ratio structures with a wide range of materials, the excellent conformality, and the exquisite thickness control have made ALD an essential tool for the fabrication of many devices, including biosensors. This mini-review aims to provide a summary of the different ways ALD has been used to prepare biosensor devices. The materials that have been deposited by ALD, the use of the ALD layers prepared and the different types of biosensors fabricated are presented. A selected list of studies will be used to illustrate how the ALD route can be implemented to improve the operational performance of biosensors. This work comprehensively shows the benefits of ALD and its application in various facets of biosensing and will help in exploiting the numerous prospects of this emerging and growing field.

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Chimie
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Biosensors and Bioelectronics, 2018, 122, 147-159.pdf (1.86 Mo) Télécharger le fichier
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Dates et versions

hal-01919095 , version 1 (04-06-2021)

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Octavio Graniel, Matthieu Weber, Sebastien Balme, Philippe Miele, Mikhael Bechelany. Atomic layer deposition for biosensing applications. Biosensors and Bioelectronics, 2018, 122, pp.147 - 159. ⟨10.1016/j.bios.2018.09.038⟩. ⟨hal-01919095⟩
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