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Article Dans Une Revue Applied Physics Letters Année : 2012

Nanocrystalline-to-amorphous transition in nanolaminates grown by low temperature atomic layer deposition and related mechanical properties

Résumé

We report on a comprehensive structural and nanoindentation study of nanolaminates of Al2O3 and ZnO synthesized by atomic layer deposition (ALD). By reducing the bilayer thickness from 50 nm to below 1 nm, the nanocrystal size could be controlled in the nanolaminate structure. The softer and more compliant response of the multilayers as compared to the single layers of Al2O3 and ZnO is attributed to the structural change from nanocrystalline to amorphous at smaller bilayer thicknesses. It is also shown that ALD is a unique technique for studying the inverse Hall-Petch softening mechanism (E. Voce and D. Tabor, J. Inst. Metals 79(12), 465 (1951)) related to grain size effects in nanomaterials.

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Chimie
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Dates et versions

hal-01692064 , version 1 (04-06-2021)

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R. Raghavan, Mikhael Bechelany, M. Parlinska, D. Frey, W. Mook, et al.. Nanocrystalline-to-amorphous transition in nanolaminates grown by low temperature atomic layer deposition and related mechanical properties. Applied Physics Letters, 2012, 100 (19), ⟨10.1063/1.4711767⟩. ⟨hal-01692064⟩
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